Improvement of plasma etching endpoint detection with data-driven wavelength selection and Gaussian mixture model
Chae Sun Kim, Hye Ji Lee, Hae Rang Roh, Taekyoon Park, Yongseok Lee, Jewoo Han, Sungun Kwon, Chanmin Lee, Jongwoo Sun, Kukhan Yoon, Jong Min Lee*
│ IEEE Transactions on Semiconductor Manufacturing
│ 389-39